Process Design Scheme for High-Purity Water System in the New Materials Production Industry
Process Design Scheme for High-Purity Water System in the New Materials Production Industry
1.0 Design Basis and Standards
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Product Water Use: New material synthesis, powder preparation, substrate cleaning, chemical preparation, R&D experiments, etc.
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Product Water Standards: Chinese National Standard GB/T 11446.1-2013 Electronic Grade WaterEW-I to EW-IV grades, or customized based on specific material process requirements (e.g., Resistivity ≥18.2 MΩ·cm, TOC ≤5 ppb, Particles ≤1 count/mL).
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Design Codes: Complies with relevant industry guidelines such as GMP, FDA, SEMI.
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Core Requirements: Ultra-high water purity, system stability and reliability, optimized operational costs, intelligent monitoring.
2.0 Source Water Quality and Product Water Targets
|
Parameter |
Source Water (City Tap Water Example) |
Product Water Target (EW-I Grade) |
|---|---|---|
|
Resistivity (25°C) |
0.5 - 1.5 kΩ·cm |
≥18.2 MΩ·cm |
|
Total Organic Carbon (TOC) |
1 - 5 ppm |
≤5 ppb |
|
Particles (≥0.1 μm) |
10⁴ - 10⁵ counts/mL |
≤1 count/mL |
|
Total Bacterial Count |
10² - 10³ CFU/mL |
≤0.1 CFU/mL |
|
Dissolved Oxygen (DO) |
8 - 10 ppm |
≤10 ppb (Optional: ≤1 ppb after deoxygenation) |
|
Silica (SiO₂) |
5 - 20 ppm |
≤0.5 ppb |
|
Metal Ions (individual) |
0.01 - 0.5 ppm |
≤0.01 ppb |
3.0 Process Flow Design
To meet the new materials industry's stringent requirements for water purity, particulates, and TOC, a comprehensive process integrating "Multi-Stage Pretreatment + Double-Pass Reverse Osmosis + EDI + Polishing Mixed Bed + Terminal Polishing" is recommended. This ensures multiple safeguards and long-term system stability.
flowchart TD
A[Source Water<br>Municipal/Well] --> B[Raw Water Tank]
B --> C[Pretreatment System]
subgraph C[Pretreatment System]
C1[Multi-Media Filter] --> C2[Activated Carbon Filter] --> C3[Water Softener] --> C4[Cartridge Filter]
end
C --> D[Primary RO System]
D --> E[Intermediate Tank]
E --> F[Secondary RO System]
F --> G[EDI System<br>Electrodeionization]
G --> H[Pure Water Tank]
H --> I[Polishing Mixed Bed]
I --> J[Terminal Polishing]
subgraph J[Terminal Polishing]
J1[UV Sterilizer] --> J2[TOC Reducer] --> J3[Ultrafiltration Unit] --> J4[Final Polishing Cartridge]
end
J --> K[Point of Use]
K --> L[New Materials Production]
M[Chemical Dosing System<br>Antiscalant/Reductant/Biocide] --> D
N[Chemical Cleaning System] --> D & F
O[Intelligent Control System<br>PLC+Online Instruments] --> C & D & F & G & I & J
Process Flow Step-by-Step Explanation:
Stage 1: Pretreatment System
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Purpose: Remove suspended solids, organics, residual chlorine, and hardness to protect downstream membrane elements.
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Multi-Media Filter: Removes suspended particles, sediment, and colloids ≥10 μm.
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Activated Carbon Filter: Adsorbs residual chlorine, organics, color, and odor, protecting RO membranes.
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Water Softener (Optional): Removes calcium and magnesium ions via sodium ion exchange resin to prevent RO scaling.
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Cartridge Filter: 5 μm precision filtration acting as the final safety barrier.
Stage 2: Reverse Osmosis Desalination System (Core Desalination)
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Primary RO: Removes approximately 97-99% of dissolved salts, organics, colloids, and bacteria.
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Secondary RO: Provides further desalination, producing water up to 1-5 MΩ·cm, providing ideal feed water for EDI.
Stage 3: Electrodeionization and Deep Polishing
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EDI Unit: Continuous electrodeionization + mixed ion exchange technology requiring no acid/base regeneration. It produces water with stable resistivity ≥10-15 MΩ·cm and is the core equipment for high-purity water production.
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Polishing Mixed Bed: Contains nuclear-grade high-purity ion exchange resin, elevating water quality to 18.2 MΩ·cm and providing deep removal of trace ions.
Stage 4: Terminal Polishing and Distribution
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UV Sterilizer: 254 nm wavelength for microbial control.
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TOC Reducer: 185 nm UV lamp oxidizes organics into ionic forms for subsequent polishing removal.
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Ultrafiltration Unit: Removes particles, bacteria, and endotoxins ≥0.1 μm.
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Final Polishing Cartridge: 0.1 μm or higher grade cartridge for final water quality assurance.
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Distribution System: Constructed with 316L stainless steel piping, fully automatic circulation to prevent stagnant zones and microbial growth.
4.0 Key Equipment and Design Parameters
|
Subsystem |
Equipment/Parameter |
Design Key Points |
|---|---|---|
|
Pretreatment |
Multi-Media/Activated Carbon/Softener Vessels |
Automatic control valves (pneumatic/electric), backwash capable, redundant design. |
|
RO System |
Membrane Elements (e.g., DOW/Hydranautics) |
Primary RO recovery: 75%, Secondary RO recovery: 85%; Equipped with HP pump, energy recovery. |
|
EDI Modules |
E.g., Evoqua Ionpure, SUEZ |
Modular design, online monitoring of resistivity, flow, temperature; with limiting current protection. |
|
Polishing Mixed Bed |
Nuclear-Grade Resin (H/OH form) |
Low-flow design, nitrogen-blanketed seal to prevent resin oxidation and contamination. |
|
Distribution System |
316L SS piping, sanitary clamp connections |
Sloped piping design, fully automatic circulation, velocity >1.0 m/s, with online TOC, resistivity, particle monitors. |
|
Control System |
PLC + HMI + SCADA |
Fully automatic operation with remote monitoring, alarms, data traceability, and access control. |
5.0 System Features and Advantages
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Multi-Barrier Design: Multiple safeguards from pretreatment to point of use, ensuring final water quality even with single-point failures.
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Environmentally Friendly: EDI replaces traditional mixed beds, reducing acid/base consumption and wastewater by over 90%.
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Intelligent Operation & Maintenance: Predictive maintenance using data analytics, real-time monitoring and alerts for key parameters (SDI, differential pressure, product water quality).
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Modular Scalability: Flexible expansion based on capacity needs, supports future production line additions.
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Compliance & Validation: System compliant with GMP/FDA requirements, supports IQ/OQ/PQ validation, and provides complete documentation.
6.0 Investment and Operating Cost Analysis
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Capital Investment: Primarily for RO/EDI/Polishing modules, high-grade piping, and control systems.
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Operating Costs: Mainly electricity (~1.5-3.0 kWh/ton of water), consumable replacement (membranes, resin, cartridges), periodic sanitization, and validation.
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System Recovery: Overall system recovery can reach 70-75% (via concentrate recycle to pretreatment).
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Water Conservation: Can integrate water reclamation or rainwater utilization systems to further enhance water resource efficiency.
7.0 Service and Support
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Design Support: Provide 3D layout drawings, Piping & Instrumentation Diagrams (P&ID), equipment lists.
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Installation & Commissioning: On-site guidance by professional team for system startup and performance testing.
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Training: Comprehensive training for operation, maintenance, and troubleshooting.
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After-Sales Service: Remote monitoring support, scheduled preventive maintenance, and fast spare parts response.
Summary: This scheme addresses the stringent requirements for ultra-pure water in the new materials industry by designing a technologically advanced, stable, reliable, intelligent, and environmentally friendly high-purity water production system. Through the combined process of pretreatment protection, two-stage RO deep desalination, EDI continuous polishing, and terminal multi-stage polishing, the system can stably produce ultra-pure water exceeding 18.2 MΩ·cm, meeting the needs of various high-end new material R&D and production. Before specific implementation, a complete analysis of the source water is recommended, and personalized adjustments should be made based on actual water production requirements, point-of-use distribution, and investment budget.



