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Nanofiltration (NF) Membrane Process for Phosphonic Acid Separation and Purification

by endalton 07 Aug 2025

Here is a professional English translation of the Nanofiltration (NF) Membrane Process for Phosphonic Acid Separation and Purification tailored for high-purity applications in electronics and flame retardant synthesis.


Process Fundamentals

  • Feed Solution Characteristics:
    • Phosphonic acid (H₃PO₃): 10–30 wt% │ pH 1.5–3.0
    • Major impurities: Na⁺/K⁺ (≤5,000 ppm), SO₄²⁻ (≤1,000 ppm), Cl⁻ (≤2,000 ppm)
  • Target Product:
    • High-purity phosphonic acid: H₃PO₃ ≥40 wt%, total impurities ≤100 ppm
    • Recovery rate ≥90%
  • Core Technology: Multi-stage NF Fractional Separation & Concentration System


Process Flow Diagram

graph LR
A[Feed Tank] --> B[Pretreatment System]
B --> C[Primary NF Stage (NF1)]
C --> D[Secondary NF Stage (NF2)]
D --> E[Phosphonic Acid Concentrate]
C --> F[Salt Permeate]
D --> G[Permeate Reuse]
F --> H[Salt Recovery]

I. Core Process Units

1. Pretreatment System (Membrane Protection)

Unit Parameters Function
Precision Filtration 0.5 μm titanium filter Remove particulates (prevent abrasion)
Cooling System Plate heat exchanger (5–10°C) Inhibit oxidation (H₃PO₃→H₃PO₄)
Reducing Agent Dosing Ascorbic acid (50–100 ppm) Maintain reducing environment (ORP≤-50 mV)
pH Adjustment H₃PO₃ (no foreign ions) Stabilize pH at 2.0±0.2

Critical Control Points: Temperature≤10°C, SDI₁₅<3, zero suspended solids


2. NF Fractionation System (Dual-Stage Concentration)

Parameter Primary NF (NF1) Secondary NF (NF2)
Membrane Type Acid-resistant (e.g., Duracid NF) Tight separation (e.g., NF270)
Rejection Mechanism Charge repulsion (+ve surface) Size exclusion (MWCO: 200–300 Da)
Operating Pressure 2.0–2.5 MPa 1.5–2.0 MPa
H₃PO₃ Rejection ≥95% ≥98%
Monovalent Ion Passage Cl⁻≥90%, Na⁺≥85% Cl⁻≥95%, Na⁺≥92%
Concentration Factor 3–5× (feed→concentrate) Final conc. to 40 wt%

Separation Mechanism:

  • NF1: Positively charged membrane rejects multivalent anions (SO₄²⁻) while permeating monovalent ions (Cl⁻, Na⁺).
  • NF2: Small-pore membrane deeply retains H₃PO₃ (MW=82 g/mol) while removing residual salts.

3. Permeate Treatment

  • Salt Recovery: NF1 permeate → Electrodialysis (ED) → Separate NaCl/Na₂SO₄.
  • Permeate Reuse: NF2 permeate (TDS≤500 ppm) recycled for cleaning or formulation.

II. Equipment Specifications

Equipment Specifications Qty
NF Membrane Elements Acid-resistant spiral-wound, 4"×40", 7.9 m² NF1: 6, NF2: 4
High-Pressure Pump Q=5 m³/h, H=250 m, Hastelloy C276 3 (VFD)
Pressure Vessels FRP, pH 0–14 resistant 10
In-line Conductivity Meter ±1% FS, acid-proof 6
Automated Valve Bank PTFE-lined diaphragm valves 1 set


III. Fouling Control & Stability

  1. Flow Dynamics:
    • Cross-flow velocity ≥1.0 m/s minimizes polarization and crystallization.
  2. Cleaning Protocol:
    • Acid wash: 0.5% HNO₃ (remove scales, every 24h).
    • Reducing wash: 1% NaHSO₃ (prevent oxidation fouling, weekly).
    • Flux recovery ≥98% post-cleaning.
  3. Material Protection:
    • Temperature ≤35°C to prevent PVDF/PES hydrolysis.
    • Full-system N₂ blanketing to exclude O₂.

IV. Performance & Economics

Metric Performance
Phosphonic Acid Purity ≥99.5 wt%
Cl⁻ Removal ≥99.8% (2,000 ppm→≤5 ppm)
SO₄²⁻ Removal ≥99.9% (1,000 ppm→≤1 ppm)
Specific Energy 15–18 kWh/m³ (main pumps)
OPEX 11–18 USD/m³ feed

Cost Breakdown:

  • Membrane replacement: 3.7 USD/m³ (≥2-year lifespan)
  • Chemicals: 3 USD/m³ (ascorbic acid/HNO₃/NaHSO₃)
  • Energy: 6 USD/m³

V. Critical Issue Mitigation

1. H₃PO₃ Oxidation Control

  • Process design: Low temperature (5–10°C) + reducing agents.
  • Emergency response: Auto liquid-N₂ injection when ORP>0.

2. Salt Scaling Risk

  • Concentration limits:
    • NF1 concentration factor ≤5× if Ca²⁺≤50 ppm.
    • Realtime LSI monitoring with auto-dilution.

3. Deep Impurity Removal

  • Polishing option: NF concentrate → Continuous Electrodeionization (CEDI) → Total ions ≤10 ppm.

Advantages vs. Evaporation Crystallization

Metric NF Membrane Process Evaporation Crystallization
H₃PO₃ Decomposition <0.1% 5–20% (thermal degradation)
Energy Consumption 18 kWh/m³ 150–200 kWh/m³
Product Purity ≥99.5 wt% 95–98 wt% (salt entrapment)
Capital Investment Moderate (membrane-focused) High (evaporators/vacuum)

Implementation Guidelines

  1. Pilot Testing:
    • Conduct 200 L/h tests; optimize membrane selection (Toray TX40/DOW NF90 recommended).
  2. Material Compatibility:
    • Piping/tanks: High-purity PVDF or PTFE-lined.
  3. Automation:
    • DCS monitoring: Temperature/pH/ORP/pressure/conductivity with auto-shutdown.

Extended Applications:

  • Sodium hypophosphite purification │ Flame retardant intermediates │ Semiconductor etching waste recovery

This process is field-proven in a 3,000-ton/year electronic-grade phosphonic acid plant, demonstrating <5% flux decline over 18 months. Final product compliance: SEMI C36 standard for chip manufacturing.

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